Ag/g-C3N4复合材料可见光降解磺胺甲基嘧啶的效能及机理研究
Degradation effect and mechanism of sulfamerazine by Ag/g-C3N4 under visible light irradiation
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摘要: 以g-C3N4为光催化材料,聚乙烯吡咯烷酮为抑制剂,采用光还原法合成了Ag/g-C3N4复合材料,考查其在可见光条件下降解磺胺甲基嘧啶的效能和机理.结果表明:在可见光照射下,Ag/g-C3N4复合材料对磺胺甲基嘧啶具有良好的降解效果,照射30 min后,磺胺甲基嘧啶的降解效率达97.3%;光生空穴和·O2-是降解磺胺甲基嘧啶的主要活性物质,在二者的作用下,磺胺甲基嘧啶的降解途径主要有S-N键断裂、苯环的羟基化、-NH2的硝基化、-CH3甲基的羧基化等.Abstract: Ag/g-C3N4 was synthesized by a photo-reduction method in the presence of g-C3N4 as the photocatacytic material and polyvinylpyrrolidone as an inhibitor. The degradation effect and mechanism of sulfamerazine by Ag/g-C3N4 was studied in the presence of visible lightir irradiation. The results indicated that sulfamerazine could be effectively degraded by Ag/g-C3N4. The degradation rate of sulfamerazine was 97. 3% after being irradiated for 30 min. Photogenerated hole and ·O2- were the main active species, which could regrade sulfamerazine by the cleavage of S-N bond, the hydroxylation of the benzene ring, the nitration of amino and the carboxylation of methyl.
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Key words:
- Ag/g-C3N4 /
- visible light irradiation /
- sulfamerazine /
- mechanism of degradation
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