JOURNAL OF LIGHT INDUSTRY

CN 41-1437/TS  ISSN 2096-1553

Volume 34 Issue 2
March 2019
Article Contents
GU Liuting, YE Fengjiao, PENG Ke, et al. Effect of Ti4+ doping Fe site on the structure and dielectric properties for CuFeO2 ceramic material[J]. Journal of Light Industry, 2019, 34(2): 43-49. doi: 10.3969/j.issn.2096-1553.2019.02.006
Citation: GU Liuting, YE Fengjiao, PENG Ke, et al. Effect of Ti4+ doping Fe site on the structure and dielectric properties for CuFeO2 ceramic material[J]. Journal of Light Industry, 2019, 34(2): 43-49. doi: 10.3969/j.issn.2096-1553.2019.02.006 shu

Effect of Ti4+ doping Fe site on the structure and dielectric properties for CuFeO2 ceramic material

  • Received Date: 2018-11-29
  • CuO,Fe2O3 and TiO2 were used as the main raw materials, and CuFe1-xTixO2 (0 ≤ x ≤ 0.08) ceramic series samples were prepared by solid state reaction method. The microstructure, morphology and dielectric properties of the samples obtained were characterized and analyzed. The internal barrier model (IBLC) was used to physically interpret the correlation between the microstructure and dielectric properties of the samples. The results showed that the doped series samples had a single-phase copper iron ore structure. Appropriate amount of Ti4+ doping could promote the grain growth of CuFeO2 ceramic samples, while the larger concentration of Ti4+ significantly inhibited the grain growth of CuFeO2 ceramic samples, and damaged the denser crystal morphology. Undoped and a small amount of Ti4+-doped (x=0.005 and 0.01) CuFeO2 samples exhibited room temperature giant dielectric properties, and proper doping of Ti4+ could effectively improve the dielectric properties of the system; IBLC model could explain the intercalation of Ti4+-doped CuFeO2 samples. The electrical mechanism, that is, the microscopic morphology of the CuFeO2 ceramic system could significantly affect the giant dielectric properties of the system.
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